Direct fabrication of surface-relief grating by interferometric technique using femtosecond laser

Applied Physics A: Materials Science and Processing

Volumn 77, Issue 7, 2003, Pages 959-963

  Venkatakrishnan, K ^a   Sivakumar, N R ^a   Hee, C W ^a   Tan, H ^a   Liang, W L ^a   Gan, G K ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; FOCUSING; INTERFEROMETRY; LASER BEAM EFFECTS; LASER TUNING; LENSES; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SURFACES;

FEMTOSECOND LASER; LASER FLUENCE; PULSE NUMBER; SURFACE-RELIEF GRATING;

DIFFRACTION GRATINGS;

EID: 0142022960     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-002-1993-4     Document Type: Article

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