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Volumn 150, Issue 10, 2003, Pages

Plasma Electrochemistry in Radio Frequency Discharges Oxidation of Silver in a Chlorine Plasma

Author keywords

[No Author keywords available]

Indexed keywords

ANODES; CURRENT DENSITY; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; GROWTH KINETICS; INDUCTIVELY COUPLED PLASMA; LEAKAGE CURRENTS; OXIDATION; PRESSURE EFFECTS; SILVER COMPOUNDS; SPUTTERING; THERMAL EFFECTS;

EID: 0142021096     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1608004     Document Type: Article
Times cited : (15)

References (32)
  • 8
    • 0142014140 scopus 로고    scopus 로고
    • Ph.D. Thesis, Justus-Liebig-Universität Giessen (open electronic library)
    • M. Vennekamp, Ph.D. Thesis, Justus-Liebig-Universität Giessen (2002); http://bibd.uni-giessen.de/ghtm/2002/uni/d020086.htm (open electronic library).
    • (2002)
    • Vennekamp, M.1
  • 16
    • 0004189682 scopus 로고
    • R. H. Huddlestone, Editor, Academic Press, New York
    • F. F. Chen, in Plasma Diagnostic Techniques, R. H. Huddlestone, Editor, Academic Press, New York (1965).
    • (1965) Plasma Diagnostic Techniques
    • Chen, F.F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.