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Journal of the Electrochemical Society

Volumn 149, Issue 4, 2002, Pages

Plasma chloriding of thin-film silver. A novel process in silver-silver chloride reference electrode fabrication

(6) Escoffier, C a Maguire, P D a Mahony, C a Graham, W G b McAdams, E T a McLaughlin, J A a

a UNIVERSITY OF ULSTER (United Kingdom)

b QUEEN'S UNIVERSITY BELFAST (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL MODIFICATION; CHLORINE COMPOUNDS; ELECTROCHEMISTRY; INDUCTIVELY COUPLED PLASMA; PLASMA APPLICATIONS; POTENTIOMETERS (RESISTORS); SILVER COMPOUNDS; SPECTROSCOPY; SURFACE PROPERTIES; THICKNESS MEASUREMENT; THIN FILMS;

PLASMA CHLORIDING; REACTION RATES;

ELECTROCHEMICAL ELECTRODES;

EID: 0036530389 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1457989 Document Type: Article

Times cited : (7)

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