An ellipsometric study of the effects of DC bias of the plasma oxidation of silicon

Solid State Communications

Volumn 97, Issue 6, 1996, Pages 531-534

  Kamioka, I ^a   Nakamura, K G ^a   Kawabe, T ^a   Kitajima, M ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

A. semiconductors; A. thin films; D. optical properties

Indexed keywords

ACCELERATION; ANNEALING; ELECTRONS; ELLIPSOMETRY; IONS; OPTICAL PROPERTIES; OXIDATION; PLASMA APPLICATIONS; THIN FILMS;

CONVENTIONAL ANODIC OXIDATION; PLASMA OXIDATION; REAL TIME ELLIPSOMETRY; REFLECTION COEFFICIENT; SAMPLE BIAS DEPENDENCE; ULTRA HIGH VACUUM CHAMBER;

SEMICONDUCTING SILICON;

EID: 0030082175     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/0038-1098(95)00618-4     Document Type: Article

References (24)

1. S. Kimura, E. Murakami, K. Miyake, T. Warabisako, H. Sunami & T. Tokuyama, J. Electrochem. Soc. 132, 1460 (1985).
2. J.Y.Z. Hu, J. Joseph & E.A. Irene, Appl. Phys. Lett. 59, 1353 (1991).
3. J. Joseph, Y.Z. Hu & E.A. Irene, J. Vac. Sci. Technol. B10, 611 (1992).
4. Y.Z. Hu, Y.Q. Wang, M. Li, J. Joseph & E.A. Irene, J. Vac. Sci. Technol. A11, 900 (1993).
5. D.A. Carl, D.W. Hess, M.A. Lieberman, D. Nguyen & R. Gronsky, J. Appl. Phys. 70, 3301 (1991).
6. D.A. Carl, D.W. Hess & M.A. Lieberman, J. Vac. Sci. Technol. A8, 2924 (1990).
7. H. Kuroki, H. Shinno, K.G. Nakamura, M. Kitajima & T. Kawabe, J. Appl. Phys. 71, 5278 (1992); Proc. Mater. Chemistry '92, March 12-13, 1992, Tsukuba, Japan, p. 407. Mitsubishi Research Institute, Tokyo (1992).
8. H. Kuroki, H. Shinno, K.G. Nakamura, M. Kitajima & T. Kawabe, J. Appl. Phys. 71, 5278 (1992); Proc. Mater. Chemistry '92, March 12-13, 1992, Tsukuba, Japan, p. 407. Mitsubishi Research Institute, Tokyo (1992).
9. M. Kitajima, H. Kuroki, H. Shinno & K.G. Nakamura, Solid State Commun. 83, 385 (1992).
10. H. Shinno & M. Kitajima, Thin Solid Films 228, 129 (1993).
11. H. Kuroki, K.G. Nakamura, I. Kamioka, T. Kawabe & M. Kitajima, J. Vac. Sci. Technol. A12, 1431 (1994).
12. E.D. Palik, Handbook of Optical Constants of Solids. Academic Press, New York (1985).
13. R.M. Azzam & N.M. Bashara, Ellipsometry and Polarized Light, Chapter 6. North-Holland, Amsterdam (1989).
14. H. Kuroki, K.G. Nakamura, T. Kawabe & M. Kitajima, Solid State Commun. 88, 487 (1993).
15. M. Yamamoto & T. Namioka, Appl. Opt. 31, 1612 (1992).
16. J.W.O. Faul, U.G. Volkmann & K. Knorr, Surf. Sci. 227, 390 (1990).
17. A. Itakura, PhD Thesis, Chapter 3. Gakushuin University (1990); A. Itakura & I. Arakawa, J. Vac. Sci. Technol. A9, 1779 (1991).
18. A. Itakura, PhD Thesis, Chapter 3. Gakushuin University (1990); A. Itakura & I. Arakawa, J. Vac. Sci. Technol. A9, 1779 (1991).
19. F. Meyer & G.A. Bootsma, Surf. Sci. 84, 355 (1979).
20. C.E. Lebernight & B. Lustman, J. Opt. Soc. Am. 29, 59 (1939).
21. F.F. Chen, Introduction to Plasma Physics, Chapter 5. Plenum, New York (1974).
22. F. Chao, M. Costa & J. Lecoeur, Electrochim. Acta 36, 1839 (1991).
23. F.P. Fehlner & N.F. Mott, Oxidation of Metals and Alloys, Chapter 3. American Society for Metals, Metals Park, Ohio (1970).
24. N. Cabrera & N.F. Mott, Rept. Prog. Phys. 12, 163 (1948).