Effects of dry etching processes on effective refractive index of ZnTe surface layers in terahertz region

Journal of Applied Physics

Volumn 94, Issue 6, 2003, Pages 3800-3804

  Wu, S ^a   Ren, Z Q ^a   Shen, W Z ^a   Ogawa, H ^b   Guo, Q X ^b  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b SAGA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; ELECTROOPTICAL EFFECTS; PLASMA APPLICATIONS; REACTIVE ION ETCHING; REFRACTIVE INDEX;

SURFACE LAYERS;

ZINC COMPOUNDS;

EID: 0141990582     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1602568     Document Type: Article

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