Preparation of stopping masks for the P-LIGA technique with focused ion beams

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 139, Issue 1-4, 1998, Pages 359-362

  Menzel, R ^a   Bachmann, T ^a   Wesch, W ^a   Schmidt, C ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

Focused ion beam; LIGA; Silicon; Sputtering

Indexed keywords

ATOMIC FORCE MICROSCOPY; BINDING ENERGY; COMPUTER SOFTWARE; ELECTRIC CURRENTS; INTERFACIAL ENERGY; ION BEAMS; MASKS; METAL FOIL; ROUGHNESS MEASUREMENT; SEMICONDUCTING GALLIUM; SEMICONDUCTING SILICON;

PROTON LITHOGRAPHY, GALVANOFORMING AND PLASTIC MOULDING (PLIGA); SOFTWARE PACKAGE TRIM;

ION IMPLANTATION;

EID: 0032041495     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(97)00958-0     Document Type: Article

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