Dynamic reaction cell ICPMS for trace metal analysis of semiconductor materials

Analytical Chemistry

Volumn 75, Issue 19, 2003, Pages

  Kawabata, Katsu ^a   Kishi, Yoko ^a   Thomas, Robert ^b  

^a PerkinElmer Life and Analytical Sciences   (United States)

^b Scientific Solutions   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INDUCTIVELY COUPLED PLASMA; MASS SPECTROMETRY; TRACE ANALYSIS; TRACE ELEMENTS;

SPECTRAL INTERFERENCES;

SEMICONDUCTOR MATERIALS;

ARGON; SOLVENT; TRACE METAL;

CELL; CHEMICAL ANALYSIS; ELECTRONICS INDUSTRY; MASS SPECTROMETRY; REVIEW; SEMICONDUCTOR;

EID: 0141889867     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac0313926     Document Type: Review

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