Achieving high trace-metal purity levels using dynamic reaction cell ICP-MS

MICRO

Volumn 21, Issue 3, 2003, Pages 37-42

  Ping, Chia Mui ^c   Kishi, Yoko ^a   Kawabata, Katsu ^a   Thomas, Robert ^b  

^a PERKINELMER INC   (United States)

^b Scientific Solutions   (United States)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; CORROSION; ELECTRIC FIELDS; INDUCTIVELY COUPLED PLASMA; INTEGRATED CIRCUITS; LITHOGRAPHY; MASS SPECTROMETRY; METAL ANALYSIS; TRACE ELEMENTS;

DYNAMIC REACTION CELLS (DRC);

SEMICONDUCTOR MATERIALS;

EID: 0038173505     PISSN: 10810595     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)

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