High-performance 193-nm positive resist using alternating polymer system of functionalized cyclic olefins/maleic anhydride

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999 (II), Issue , 2000, Pages 1128-1135

  Douki, Katsuji ^a   Kajita, Toru ^a   Shimokawa, Tsutomu ^a  

^a JSR CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; COMPUTATIONAL METHODS; FREE RADICAL POLYMERIZATION; MASKS; POLYOLEFINS; SOLUBILITY; SYNTHESIS (CHEMICAL);

DIELS-ALDER REACTION; ETCH RESISTANCE; HYDROPHILICITY; POLYMALEIC ANHYDRIDE; TETRACYCLODODECENE;

PHOTORESISTS;

EID: 0033689380     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.388277     Document Type: Conference Paper

References (7)