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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2750-2754

Inductively coupled plasma reactive ion etching of AlxGa1-xN for application in laser facet formation

(4) Khan, F A a Zhou, L a Ping, A T a Adesida, I a

a University of Illinois at Urbana Champaign (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033263052 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (21)

References (16)

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