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Applied Physics A: Materials Science and Processing

Volumn 74, Issue 1, 2002, Pages 13-17

Size evolution and photoluminescence of silicon nanocrystallites in evaporated SiOx thin films upon thermal processing

(2) Kahler, U a Hofmeister, H a

a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; PARTIAL PRESSURE; PHASE SEPARATION; PHOTOLUMINESCENCE; SILICON; SILICON COMPOUNDS; THERMAL EFFECTS; THIN FILMS; VACUUM APPLICATIONS;

NANOCRYSTALLITES; PHONON REPLICA; SILICON MONOXIDE; THERMAL PROCESSING;

NANOSTRUCTURED MATERIALS;

EID: 0141760921 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390100993 Document Type: Review

Times cited : (42)

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