Origin of residual stress in the formation of boron nitride film by sputtering with Ar ions

Journal of Applied Physics

Volumn 94, Issue 5, 2003, Pages 3057-3060

  Kirn, Hong Suk ^a   Park, Jong Keuk ^a   Baik, Young Joon ^a   Choi, In Hoon ^b  

^a Korea Institute of Science and Technology   (South Korea)

^b Korea University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CUBIC BORON NITRIDE; IONS; RESIDUAL STRESSES; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY;

STRESS STATE;

SEMICONDUCTING FILMS;

EID: 0141745943     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1600527     Document Type: Article

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