The growth of CoSi2 thin film in Co/W/Si(100) multilayer structures

Solid State Communications

Volumn 128, Issue 6-7, 2003, Pages 239-244

  Moshfegh, A Z ^a   Hashemifar, S J ^b   Akhavan, O ^a  

^a SHARIF UNIVERSITY OF TECHNOLOGY   (Iran)

^b ISFAHAN UNIVERSITY OF TECHNOLOGY   (Iran)

Author keywords

A. Silicidation; C. CoSi2; C. W interlayer; D. Thermal stability

Indexed keywords

ANNEALING; FILM GROWTH; MULTILAYERS; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

MULTILAYER STRUCTURES;

COBALT COMPOUNDS;

EID: 0141733100     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssc.2003.08.013     Document Type: Article

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