LPP-based reflectometer for characterization of EUV lithography systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 647-655

  Miyake, Akira ^a   Miyachi, Takeshi ^a   Amemiya, Mitsuaki ^a   Hasegawa, Takayuki ^a   Ogushi, Nobuaki ^a   Yamamoto, Takeshi ^a   Masaki, Fumitaro ^a   Watanabe, Yutaka ^a  

^a CANON INC   (Japan)

Author keywords

Debris mitigation; Monochromator; Multilayer; Polarizer

Indexed keywords

DIFFRACTION GRATINGS; LASER BEAMS; LASER PRODUCED PLASMAS; LIGHT REFLECTION; MIRRORS; MONOCHROMATORS; OPTICAL BEAM SPLITTERS; OPTICAL MULTILAYERS; REFLECTOMETERS; ULTRAVIOLET RADIATION;

BEAM INTENSITY MONITOR; DEBRIS MITIGATION; EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM; POLARIZER; TOROIDAL MIRROR;

PHOTOLITHOGRAPHY;

EID: 0141724701     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.484969     Document Type: Conference Paper

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