Development of an EUV reflectometer using a laser-plasma X-ray source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4144, Issue , 2000, Pages 76-81

  Kondo, Hiroyuki ^a   Kandaka, Noriaki ^a   Sugisaki, Katsumi ^a   Oshino, Tetsuya ^a   Shiraishi, Masayuki ^a   Ishiyama, Wakana ^a   Murakami, Katsuhiko ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELEMENTARY PARTICLE SOURCES; REFLECTOMETERS; ULTRAVIOLET INSTRUMENTS; X RAY LITHOGRAPHY;

EXTREME ULTRAVIOLET (EUV) REFLECTOMETER; MULTILAYER MIRRORS; MULTILAYER OPTICS;

LASER PRODUCED PLASMAS;

EID: 0034498545     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.405906     Document Type: Conference Paper

References (3)