CD control with effective exposure dose monitor technique in photolithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 I, Issue , 2002, Pages 280-287

  Asano, Masafumi ^a   Izuha, Kyoko ^a   Fujisawa, Tadahito ^a   Inoue, Soichi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

CD; Critical dimension; Dose monitor; Effective dose; Effective focus; Photolithography

Indexed keywords

DOSIMETERS; DOSIMETRY; OPTIMIZATION; SCANNING; SEMICONDUCTOR DEVICE MANUFACTURE;

DOSE MONITORING;

PHOTORESISTS;

EID: 0036414406     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474577     Document Type: Conference Paper

References (4)

1. C.P. Ausschnitt, C.J. Progler, and W. Chu, "CD control of low k-factor step-and-scan lithography," Proc. SPIE 4346, pp. 293-302, 2001.
2. S. Inoue, T. Fujisawa, and K. Izuha, "Effective Exposure Dose Measurement in Optical Microlithography," Proc. SPIE 3998, pp. 810-818, 2000.
3. K. Izuha, T. Fujisawa, M. Asano and S. Inoue, "Highly Accurate and Precise Measurement Technique for Effective Exposure Dose," Jpn. J. Appl. Phys. 39, pp. 6796-6800, 2000.
4. A. Starikov, "Exposure Monitor Structure," Proc. SPIE 1261, pp. 315-324, 1990.