Correction method for high-precision CD-measurements on electrostatically charged wafers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4689 I, Issue , 2002, Pages 128-137

  Ose, Yoichi ^a   Ezumi, Makoto ^a   Ishijima, Tatsuaki ^a   Todokoro, Hideo ^a   Nagai, Kouichi ^a  

^a HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

Author keywords

Autofocus; Charging; Critical dimension measurement; Electron optics; Scanning electron microscope

Indexed keywords

ELECTRIC CHARGE; ELECTRON OPTICS; LASER BEAMS; LENSES; SCANNING ELECTRON MICROSCOPY;

CRITICAL DIMENSION MEASUREMENT;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0036031218     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.473508     Document Type: Conference Paper

References (5)

1. B. Singh, S. Gupta and B. Choo, "Restoration of CD fidelity by dissipating electrostatic charge," US Patent 5,977,542, Date of Patent Nov. 2, 1999.
2. L. Reimer, "Image Formation in Low-Voltage Electron Microscopy," SPIE vol. TT12, pp.71-88, 1993.
3. M. Ezumi, T. Otaka, H. Mori, H. Todokoro and Y. Ose, "Development of Critical Dimension Measurement Scanning Electron Microscope for ULSI (S-8000series)," Proceeding of SPIE vol. 2725, pp. 105-113, 1996.
4. Y. Ose, M. Ezumi and H. Todokoro, "Improved CD-SEM Optics with Retarding and Boosting Electric Fields," Proceeding of SPIE vol. 3677, pp. 930-939, 1999.
5. M.T. Postek, A.E. Vladar and J. Villarrubia, "Is a Production Level Scanning Electron Microscope Linewidth Standard Possible?," Proceeding of SPIE vol. 3998, pp42-56, 2000.