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Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4404, Issue , 2001, Pages 313-324

Automatic resist parameter calibration procedure for lithography simulation

(5) Tollkuehn, B a Hoepfl, M a Erdmann, A a Majoni, S a Jess, M a

a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB (Germany)

Author keywords

Lithography simulation; Parameter tuning; Resist modeling

Indexed keywords

COMPUTER SIMULATION; CORRELATION METHODS; MATHEMATICAL MODELS; PARAMETER ESTIMATION; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE;

PARAMETER TUNING;

PHOTOLITHOGRAPHY;

EID: 0034839563 PISSN: 0277786X EISSN: None Source Type: Journal
DOI: 10.1117/12.425221 Document Type: Article

Times cited : (5)

References (13)

1
- 0032666685
- Simulation of optical lithography
- (1999) Proc. SPIE , vol.3729 , pp. 480
- Erdman, A.¹

2
- 0030313081
- Method of easily extracting resist development parameters for lithography simulation
- (1996) Proc. SPIE , vol.2726 , pp. 348
- Lucas, K.D.¹ Ivin, V.V.² Kudrja, V.P.³ Larin, D.Y.⁴ Makhviladze, T.M.⁵ Medvedeva, M.G.⁶ Rogov, A.A.⁷ Verzunov, S.V.⁸ Yang, D.C.⁹

3
- 0000980338
- Bleaching-induced changes in the dispersion curves of DNQ photoresists
- (1997) Proc. SPIE , vol.3049 , pp. 585
- Henderson, C.L.¹ Willson, C.G.² Dammel, R.R.³ Synowicki, R.A.⁴

4
- 0030314582
- Lithography model tuning: Matching simulation to experiment
- (1996) Proc. SPIE , vol.2726 , pp. 223
- Thornton, S.¹ Mack, C.²

5
- 0033716193
- Factors affecting pitch bias in lithography simulation
- (2000) Proc. SPIE , vol.4000 , pp. 744
- Robertson, S.¹ Pavelchek, E.K.² Swible-Keane, C.I.³ Bohland, J.F.⁴ Reilly, M.T.⁵

6
- 0000927530
- Photoresist characterisation for lithography simulation Part 2: Exposure parameter measurements
- (1997) Proc. SPIE , vol.3049 , pp. 816
- Henderson, C.L.¹ Pancholi, S.N.² Chowdhury, S.A.³ Willson, C.G.⁴ Dammel, R.R.⁵

7
- 0000927528
- Photoresist characterisation for lithography simulation Part 3: Development parameter measurements
- (1997) Proc. SPIE , vol.3049 , pp. 805
- Henderson, C.L.¹ Tsiartas, P.C.² Pancholi, S.N.³ Chowdhury, S.A.⁴ Dombrowski, K.D.⁵ Willson, C.G.⁶ Dammel, R.R.⁷

8
- 0000927529
- Photoresist characterisation for lithography simulation Part 4: Processing effects on resist parameters
- (1997) Proc. SPIE , vol.3049 , pp. 212
- Henderson, C.L.¹ Tsiartas, P.C.² Flanagin, L.W.³ Pancholi, S.N.⁴ Chowdhury, S.A.⁵ Dombrowski, K.D.⁶ Chinwalla, A.N.⁷ Willson, C.G.⁸

9
- 0003742357
- thesis at the department of Imaging Sciences and Media Technology, University of Applied Science Cologne
- (2000) Simulation Calculations for Optical Lithography at Philips S/C SMST GmbH
- Hoepfl, M.¹

10
- 0029728258
- Examination of isolated and grouped feature bias in positive acting, chemically amplified resist systems
- (1996) Proc. SPIE , vol.2724 , pp. 163
- Petersen, J.S.¹ Byers, J.D.²

11
- 0001156096
- Novel diffusion analysis in advanced chemically amplified DUV resists using photometric methods
- (1999) J.Photopolym. Sci. Technol. , vol.12 , pp. 695
- Richter, E.¹ Hien, S.² Sebald, M.³

12
- 84995606737
- The software was developed in a cooperation between Sigma-C and the Fraunhofer-Institute IIS-B
- SOLID-C a product of Sigma-C

13
- 84995606726
- Comparison of simulation approaches for chemically amplified resists
- this volume
- Proc. SPIE
- Erdmann, A.¹ Henke, W.² Robertson, S.³ Richter, E.⁴ Tollkühn, B.⁵ Hoppe, W.⁶

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