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Volumn 20, Issue 2, 2002, Pages 531-536

Recent advances in resists for 157 nm microlithography

Author keywords

[No Author keywords available]

Indexed keywords

ANIONIC POLYMERIZATION; CARBON MONOXIDE; COPOLYMERIZATION; ELECTRON ENERGY LEVELS; ELECTRON TRANSITIONS; ELLIPSOMETRY; FLUORINE CONTAINING POLYMERS; FREE RADICAL POLYMERIZATION; LITHOGRAPHY; QUANTUM THEORY; ULTRAVIOLET SPECTROSCOPY;

EID: 0036506078     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1450589     Document Type: Article
Times cited : (12)

References (17)
  • 12
    • 0009053311 scopus 로고    scopus 로고
    • European Patent Application No. WO1999US21912
  • 14
    • 0009009622 scopus 로고    scopus 로고
    • doctoral dissertation, The University of Texas at Austin, May
    • (2001)
    • Cho, S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.