Pattern shape comparison methods using SEM image

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 II, Issue , 2003, Pages 950-961

  Ikeda, T ^a   Kotani, T ^a   Sato, T ^a   Ueno, K ^b   Matsuoka, R ^c  

^a TOSHIBA CORPORATION   (Japan)

^b TOPCON CORPORATION   (Japan)

^c SEIKO INSTRUMENTS INC   (Japan)

Author keywords

CD SEM; Fourier descriptor; GDS II

Indexed keywords

ALGORITHMS; COMPUTER AIDED DESIGN; EDGE DETECTION; FINITE ELEMENT METHOD; FOURIER TRANSFORMS; INSPECTION; SPATIAL VARIABLES MEASUREMENT;

CRITICAL SHAPE DIFFERENCE; EDGE LOCATION; FOURIER DESCRIPTOR; PATTERN SHAPE COMPARISON METHODS;

SCANNING ELECTRON MICROSCOPY;

EID: 0141611909     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482831     Document Type: Conference Paper

References (5)

1. Mack, C. et al., "Metrology and Analysis of Two Dimensional SEM Patterns", Proc. SPIE 4344, 377-384, 2001.
2. Matsuoka, R. et al., "New method for the quantitative evaluation of wafer pattern shape based on CAD data", Proc. SPIE in press, 2003.
3. For more precise application results, see: K. Hashimoto et al. "Experimental verification methodology for model-based process proximity correction", Proc. SPIE, to be published 2003.
4. Zahn, C.T. and Roskies, R.Z.: IEEE Transactions on Computers, Vol.C-21, No.3, 269-281(1972).
5. Uesaka, Y., "A New Fourier Descriptor Applicable to Open Curves", Transaction of IEICE, J67-A, 166-173, 1984.