Development of scanning probe microscope for Auger analysis

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 7 B, 2003, Pages 4848-4851

  Miyatake, Yutaka ^a,b   Nagamura, Toshihiko ^b   Hattori, Ken ^b   Kanemitsu, Yoshihiko ^a   Daimon, Hiroshi ^a  

^a NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^b Japan Science and Technology Agency   (Japan)

Author keywords

Auger electron energy spectroscopy; Element analysis; Field emission; Scanning tunneling microscopy

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CATHODES; DIFFRACTIVE OPTICS; ELECTRIC FIELDS; ELECTRON BEAMS; ION BOMBARDMENT; MICROSCOPES; MIRRORS; SILICON WAFERS; VACUUM;

AUGER ELECTRON ENERGY SPECTROSCOPY; AUGER ELEMENT ANALYSIS; FIELD EMISSION; SCANNING PROBE MICROSCOPE;

SCANNING TUNNELING MICROSCOPY;

EID: 0141569198     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.4848     Document Type: Article

References (6)

1. B. Reihl and J. K. Gimzewski: Surf. Sci. 189/190 (1987) 36.
2. B. J. Eves, F. Festy, K. Svensson and R. E. Palmar: Appl. Phys. Lett. 77 (2000) 4223.
3. Y. Hasegawa, J. F. Jia, K. Inoue, A. Sasaki and T. Sakurai: Surf. Sci. 386 (1997) 328.
4. M. Tomimori, H. Terai and T. Arai: Appl. Surf. Sci. 144/145 (1999) 123.
5. M. Tomitori, M. Hirade, Y. Suganuma and T. Arai: Surf. Sci. 493 (2001) 49.
6. Y. Miyatake, T. Nagamura, K. Hattori, Y. Kanemitsu and H. Daimon: Jpn. J. Appl. Phys. 41 (2002) 4943.