An applicability of scanning tunneling microscopy for surface electron spectroscopy

Surface Science

Volumn 493, Issue 1-3, 2001, Pages 49-55

  Tomitori, M ^a   Hirade, M ^a   Suganuma, Y ^a   Arai, T ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Auger electron spectroscopy; Electron energy loss spectroscopy (EELS); Field emission microscopy; Germanium; Scanning tunneling microscopy; Silicon

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ELECTRON BEAMS; ELECTRON EMISSION; ELECTRON ENERGY ANALYZERS; ELECTRON ENERGY LOSS SPECTROSCOPY; FIELD EMISSION MICROSCOPES; GERMANIUM; SCANNING TUNNELING MICROSCOPY; SUBSTRATES;

AUGER ELECTRONS;

SILICON;

EID: 0035500568     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(01)01188-8     Document Type: Conference Paper

References (10)