SiO mass spectrometry and Si-2p photoemission spectroscopy for the study of oxidation reaction dynamics of Si(001) surface by supersonic O2 molecular beams under 1000 K

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 7 B, 2003, Pages 4671-4675

  Teraoka, Yuden ^a   Yoshigoe, Akitaka ^a   Moritani, Kousuke ^a,b  

^a JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Incident energy; O2; Passive oxidation; Photoemission spectroscopy; Si 2p; Si(001); SiO; Synchrotron radiation

Indexed keywords

DESORPTION; MASS SPECTROMETRY; MOLECULAR BEAMS; OXIDATION; PHOTOEMISSION; REACTION KINETICS; SILICA; SPECTROSCOPIC ANALYSIS; SYNCHROTRON RADIATION;

OXIDATION REACTION DYNAMICS; OXIDE-NUCLEI QUALITY; PASSIVE OXIDATION; PHOTOEMISSION SPECTROSCOPY; SUPERSONIC OXIDE MOLECULAR BEAM;

SEMICONDUCTING SILICON;

EID: 0141540519     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.4671     Document Type: Article

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