Initial oxidation processes of Si(001) surfaces by supersonic O2 molecular beams: Different oxidation mechanisms for clean and partially-oxidized surfaces

Shinku/Journal of the Vacuum Society of Japan

Volumn 45, Issue 7, 2002, Pages 604-608

  Teraoka, Yuden ^a   Yoshigoe, Akitaka ^a  

^a JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMISORPTION; DIMERS; DISSOCIATION; MOLECULAR BEAMS; OXIDATION; OXYGEN; PHOTOEMISSION; POTENTIAL ENERGY; PROBABILITY; SPECTROSCOPIC ANALYSIS; SURFACE CHEMISTRY;

PHOTOEMISSION SPECTROSCOPY;

SEMICONDUCTING SILICON;

EID: 0036389948     PISSN: 05598516     EISSN: None     Source Type: Journal    
DOI: 10.3131/jvsj.45.604     Document Type: Article

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