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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 12 B, 2000, Pages 7026-7030

Initial oxidation of Si(001) induced by the translational kinetic energy of O2 supersonic molecular beams

(3) Yoshigoe, Akitaka a Sano, Mutsumi a Teraoka, Yuden a

a JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE (Japan)

Author keywords

Desorbed SiO; O2 molecular scattering; Potential energy barrier; Si(001) oxidation; Supersonic molecular beam; Translational kinetic energy; X ray photoemission spectroscopy (XPS)

Indexed keywords

CHEMISORPTION; KINETIC ENERGY; MOLECULAR BEAMS; MOLECULAR DYNAMICS; MOLECULAR STRUCTURE; OXIDATION; POTENTIAL ENERGY; SUBSTRATES; THRESHOLD VOLTAGE; X RAY PHOTOELECTRON SPECTROSCOPY;

SUPERSONIC MOLECULAR BEAMS; TRANSLATIONAL KINETIC ENERGY;

SEMICONDUCTING SILICON;

EID: 0034427978 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.39.7026 Document Type: Article

Times cited : (9)

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