Surface Roughness Evolution in Amorphous Tantalum Oxide Films Deposited by Pulsed Reactive Sputtering

Materials Research Society Symposium - Proceedings

Volumn 749, Issue , 2002, Pages 107-112

  Jain, Pushkar ^a   Juneja, Jasbir S ^a   Karabacak, Tansel ^a   Rymaszewski, Eugene J ^a   Lu, Toh Ming ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CORRELATION METHODS; MONTE CARLO METHODS; SPUTTER DEPOSITION; SURFACE ROUGHNESS;

MICRO-ROUGHNESS;

TANTALUM COMPOUNDS;

EID: 0141538098     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-749-w5.11     Document Type: Conference Paper

References (22)

1. C. Hashimoto, H. Oikawa, and N. Honma, IEEE Trans. Electron Devices 36, 14 (1989).
2. G. Q. Lo, D. L. Kwong, P. C. Fazan, V. K. Mathews, and N. Sandler, IEEE Electron Device Lett. 14, 216 (1993).
3. C. Chaneliere, J. L. Autran, R. A. B. Devine, and B. Balland, Mater. Sci. Eng. R. 22, 269 (1998).
4. J.-Y. Kim, A. Garg, E.J. Rymaszewski, and T.-M. Lu, IEEE Trans. Comp. Packag. Technol. 24 (3), 526 (2001).
5. Y.-P. Zhao, G.-C Wang, T.-M Lu, G. Palasantas, and J. Th, M. De Hosson, Phys. Rev. B60, 9157 (1999).
6. J.T. Drotar, Y.-P. Zhao, T.-M Lu, and G.-C Wang, Phys. Rev. B61, 3012 (2000).
7. J.T. Drotar, Y.-P. Zhao, T.-M Lu, and G.-C Wang, Phys. Rev. B62, 2118 (2000).
8. X. M. Wu, P. K. Wu, T.-M lu, and E. J. Rymaszewski, Appl. Phys. Lett. 62 (25), 3264 (1993).
9. 9. M. C. Nielsen, J.-Y Kim, E. J. Rymaszewski, T-M Lu, A. Kumar, and H. Bakhru, IEEE Trans. Comp., Packag. Manufact. Technol. B. 21 (3), 274 (1998).
10. W. D. Sproul, M. E. Graham, M. S. Wong, S. Lopez, D. Li, and R. A. Scholl, J. Vac. Sci. Technol. A 13, 1188(1995).
11. T.-M. Lu, H.-N. Yang, and G.-C. Wang, in Fractal Aspects of Materials, edited by F. Family, P. Meakin, B. Sapoval, and R. Wool, Mat. Res. Soc. Symp. Proc. 367, 283 (1995).
12. Y.-P. Zhao, G.-C. Wang, and T.-M. Lu, Characterization of Amorphous and Crystalline Rough Surfaces: Principles and Applications, (Academic Press, San Diego, 2000).
13. J. Aue and J. Th. M. De Hosson, Appl. Phys. Lett. 71, 1347 (1997).
14. Q.M. Hudspeth, K.P. Nangle, Y.-P. Zhao, T. Karabacak, C.V. Nguyen, M. Meyyappan, G.-C. Wang, and T.-M. Lu, Surface Science, 515/2-3, 453-461(2002).
15. A.-L. Barabasi and H. E. Stanley, Fractal Concepts in Surface Growth (Cambridge University, Cambridge, England, 1995.
16. See Refs. 3 and H. You, R. P. Chiarello, H. K. Kim, and K. G. Vadervoort, Phys. Rev. Lett 70, 2900 (1993); A. E. Lita and J. E. Sanchez, Phys. Rev. B61, 7692 (2000); A. E. Lita and J. E. Sanchez, J. Appl. Phys. 85, 876 (1999).
17. See Refs. 3 and H. You, R. P. Chiarello, H. K. Kim, and K. G. Vadervoort, Phys. Rev. Lett 70, 2900 (1993); A. E. Lita and J. E. Sanchez, Phys. Rev. B61, 7692 (2000); A. E. Lita and J. E. Sanchez, J. Appl. Phys. 85, 876 (1999).
18. See Refs. 3 and H. You, R. P. Chiarello, H. K. Kim, and K. G. Vadervoort, Phys. Rev. Lett 70, 2900 (1993); A. E. Lita and J. E. Sanchez, Phys. Rev. B61, 7692 (2000); A. E. Lita and J. E. Sanchez, J. Appl. Phys. 85, 876 (1999).
19. F. Family and T. Vicsek, Dynamics of Fractal Surfaces (World Scientific, Singapore, 1991).
20. R. P. U. Karunasiri, R. Bruinsma, and J. Rudnick, Phys. Rev. Lett. 62, 788 (1989).
21. J.-H. Yao and H. Guo, Phys. Rev. E 47, 1007 (1993).
22. T. Karabacak, Y.-P. Zhao, G.-C. Wang, T.-M. Lu, Phys. Rev. B66, 075329 (2002).