Preparation of low-resistivity α-Ta thin films on (001) Si by conventional DC magnetron sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 7 A, 2003, Pages 4499-4500

  Shiojiri, Masayuki ^a   Shinkai, Satoko ^a   Sasaki, Katsutaka ^a   Yanagisawa, Hideto ^a   Abe, Yoshio ^a  

^a KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Conventional magnetron sputtering; Low resistivity Ta; Single oriented growth of (110) Ta; Surface color of Ta film; Ta

Indexed keywords

CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY OF SOLIDS; INTERFACIAL ENERGY; ION BEAMS; ION BOMBARDMENT; MAGNETRON SPUTTERING; OPTICAL MICROSCOPY; SEMICONDUCTING SILICON; TANTALUM; X RAY DIFFRACTION ANALYSIS;

ION BEAM IRRADIATION; LOW-RESISTIVITY THIN FILM;

THIN FILMS;

EID: 0141494569     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.4499     Document Type: Article

References (9)

1. C.-A. Chang: J. Appl. Phys. 67 (1990) 566.
2. Y. T. Kim, C.-H. Jun and D. Y. Kim: J. Electron. Mater. 28 (1999) 369.
3. Z. N. Dai, A. Miyashita, S. Yamamoto, K. Narumi and H. Naramoto: Thin Solid Films 347 (1999) 117.
4. T. Laurila, K. Zeng, J. K. Kivilahti, J. Molarius and I. Suni: J. Appl. Phys. 88 (2000) 3377.
5. G. S. Chen, S. C. Huang, S. T. Chen T. J. Yang, P. Y. Lee, J. H. Jou and T. C. Lin: Appl. Phys. Lett. 76 (2000) 2895.
6. K. Holloway and P. M. Fryer: Appl. Phys. Lett. 57 (1990) 1736.
7. H. Kobayashi: Supatta Hakumaku (Sputtered Thin Films) (Nikkan-kogyo-shinbunsya, Tokyo, 1993) p. 116 [in Japanese].
8. L. Liu, Y. Wang and H. Gong: J. Appl. Phys. 90 (2001) 416.
9. K. Ino, T. Shinohara, T. Ushiki and T. Ohmi: J. Vac. Sci. Technol. A 15 (1997) 2627.