Amine-reactive monolayers on scribed silicon with controlled levels of functionality: Reaction of a bare silicon surface with mono- and diepoxides

Angewandte Chemie - International Edition

Volumn 42, Issue 34, 2003, Pages 4046-4049

  Lua, Yit Yian ^a   Lee, Michael V ^a   Fillmore, William J J ^a   Matheson, Reija ^a   Sathyapalan, Amarchard ^a   Asplund, Matthew C ^a   Fleming, Steven A ^a   Linford, Matthew R ^a  

^a Brigham Young University   (United States)

Author keywords

Chemisorption; Monolayers; Nucleophilic addition; Radical reactions; Silicon

Indexed keywords

MONOLAYERS; REACTION KINETICS; SILICON; SURFACE REACTIONS;

EPOXIDES;

ORGANIC COMPOUNDS;

AMPHOLYTE; EPOXIDE; OXYGEN; SILICON;

AB INITIO CALCULATION; ARTICLE; CHEMICAL BOND; MASS SPECTROMETRY; QUANTUM YIELD; REACTION ANALYSIS; STRUCTURE ANALYSIS; SURFACE PROPERTY; SYNTHESIS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0141427668     PISSN: 14337851     EISSN: None     Source Type: Journal    
DOI: 10.1002/anie.200250846     Document Type: Article

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