Hartmann wave-front measurement at 13.4 nm with λEUV/120 accuracy

Optics Letters

Volumn 28, Issue 17, 2003, Pages 1534-1536

  Mercère, Pascal ^a,b   Zeitoun, Philippe ^a   Idir, Mourad ^a   Le Pape, Sébastien ^a   Douillet, Denis ^c   Levecq, Xavier ^b   Dovillaire, Guillaume ^b   Bucourt, Samuel ^b   Goldberg, Kenneth A ^d   Naulleau, Patrick P ^d   Rekawa, Senajith ^d  

^a UNIVERSITÉ PARIS SACLAY   (France)

^b Imagine Optic   (France)

^c LABORATOIRE D OPTIQUE APPLIQUÉE   (France)

^d LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; MIRRORS; OPTICAL FILTERS; SENSITIVITY ANALYSIS; SENSORS; ULTRAVIOLET RADIATION;

THIN MIRRORS;

WAVEFRONTS;

EID: 0043289048     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.28.001534     Document Type: Article

References (8)

1. P. P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, D. Attwood, and J. Boker, Appl. Opt. 38, 7252 (1999).
2. K. Medecki, E. Tejnil, K. A. Goldberg, and J. Bokor, Opt. Lett. 21, 1526 (1996).
3. K. A. Goldberg, Ph.D. dissertation (University of California, Berkeley, 1997).
4. E. Tejnil, K. A. Goldberg, S. H. Lee, H. Medecki, P. J. Batson, P. E. Denham, A. A. MacDowell, and J. Bokor, J. Vac. Sci. Technol. B 15, 2455 (1997).
5. W. H. Southwell, J. Opt. Soc. Am. 70, 998 (1980).
6. D. Attwood, P. P. Naulleau, K. A. Goldberg, E. Tejnil, C. Chang, R. Beguiristain, P. Batson, J. Bokor, E. M. Gullikson, M. Koike, H. Medecki, and J. H. Underwood, IEEE Quantum Electron. 35, 709 (1999).
7. D. Attwood, Soft X-Rays and Extreme Ultraviolet Radiation - Principles and Applications (Cambridge U. Press, Cambridge, England, 1999).
8. Imagine Optics, patent PCT/FR02/02495 (July 2002)