Characterization of Ar/Cu electron-cyclotron-resonance plasmas using optical emission spectroscopy

Journal of Applied Physics

Volumn 80, Issue 5, 1996, Pages 2605-2613

  Rhoades, R L ^a,b   Gorbatkin, S M ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; ARGON; COPPER; ELECTRON CYCLOTRON RESONANCE; ELECTRON ENERGY LEVELS; EMISSION SPECTROSCOPY; IONIZATION; MICROWAVES; PLASMA DENSITY; PRESSURE EFFECTS; TEMPERATURE MEASUREMENT;

ELECTRON TEMPERATURE; ION EMISSION; IONIZATION FRACTION; LANGMUIR PROBE; NEUTRAL EMISSION;

PLASMAS;

EID: 0030242451     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363177     Document Type: Article

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