Photosensitivity of functional polystyrene and poly(methyl methacrylate) synthesized by controlled radical polymerization

Macromolecules

Volumn 36, Issue 15, 2003, Pages 5482-5490

  Chan, Suk Hang ^a   Lam, Lillian Sze Man ^a   Tse, Chui Wan ^a   Man, Ka Yan Kitty ^a   Wong, Wing Tak ^a   Djurišić, Aleksandra B ^a   Chan, Wai Kin ^a  

^a UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER COMPOUNDS; LASERS; LIGHT SOURCES; MONOMERS; PHOTOCONDUCTIVITY; PHOTOSENSITIVITY; PHOTOSENSITIZERS; POLYMERIZATION; POLYMETHYL METHACRYLATES; REACTION KINETICS; RHENIUM; SYNTHESIS (CHEMICAL);

ATOM TRANSFER RADICAL POLYMERIZATION (ATRP);

POLYSTYRENES;

EID: 0043204339     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma030161y     Document Type: Article

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