Synchrotron-radiation-induced anisotropic wet etching of GaAs

Applied Physics Letters

Volumn 75, Issue 15, 1999, Pages 2274-2276

  Ma, Qing ^a   Mancini, Derrick C ^a   Rosenberg, Richard A ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0043080247     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124988     Document Type: Article

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