Analysis of stresses in Ru thin films prepared by chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 4, 2003, Pages 1381-1385

  Lim, Ha Jin ^a   Kang, Sang Yeol ^a   Hwang, Cheol Seong ^a   Kim, Hyeong Joon ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; CRYSTAL MICROSTRUCTURE; DYNAMIC RANDOM ACCESS STORAGE; GRAIN GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; RUTHENIUM; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; STRESS ANALYSIS; TENSILE STRESS; X RAY CRYSTALLOGRAPHY;

CRYSTALLINITY; LASER SCANNING METHOD; LOW ATOMIC MOBILITY;

THIN FILMS;

EID: 0043031376     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1560713     Document Type: Article

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