Erasable electrostatic lithography for quantum components

Nature

Volumn 424, Issue 6950, 2003, Pages 751-754

  Crook, Rolf ^a   Graham, Abi C ^a   Smith, Charles G ^a   Farrer, Ian ^a   Beere, Harvey E ^a   Ritchie, David A ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DOPING (ADDITIVES); ELECTRON BEAM LITHOGRAPHY; HETEROJUNCTIONS; SEMICONDUCTING GALLIUM ARSENIDE;

QUANTUM ANTIDOTS;

QUANTUM THEORY;

PHYSICS;

ARTICLE; CONDUCTANCE; ELECTRON; ELECTRONICS; ERASABLE ELECTROSTATIC LITHOGRAPHY; IMAGE ANALYSIS; MICROSCOPY; PRIORITY JOURNAL; QUANTUM MECHANICS; STRUCTURE ANALYSIS;

ANGUILLIFORMES;

EID: 0042968925     PISSN: 00280836     EISSN: None     Source Type: Journal    
DOI: 10.1038/nature01841     Document Type: Article

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