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Volumn 83, Issue 2, 2003, Pages 344-346

Single-electron tunneling in InP nanowires

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CATALYSTS; COULOMB BLOCKADE; CRYSTAL GROWTH; DEPOSITION; ELECTRON BEAMS; ELECTRON TUNNELING; FIELD EFFECT SEMICONDUCTOR DEVICES; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR DOPING; SILICON;

EID: 0042769310     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1590426     Document Type: Article
Times cited : (146)

References (20)
  • 14
    • 0041651878 scopus 로고    scopus 로고
    • note
    • High-resolution images, obtained by transmission-electron microscopy, revealed an oxide thickness up to 10 nm, with considerable wire-to-wire variations.
  • 17
    • 0043154720 scopus 로고    scopus 로고
    • note
    • 0≈0.3 μm ≲L.
  • 18
    • 0041651877 scopus 로고    scopus 로고
    • note
    • 3.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.