Electrochemical characterization of copper surface modified by n-alkanethiols in chloride-containing solutions

Applied Surface Science

Volumn 218, Issue 1-4, 2003, Pages 144-154

  Ma, H Y ^a,b   Yang, C ^b   Yin, B S ^a   Li, G Y ^a   Chen, S H ^a,c   Luo, J L ^b  

^a SHANDONG UNIVERSITY   (China)

^b UNIVERSITY OF ALBERTA   (Canada)

^c INSTITUTE OF METAL RESEARCH   (China)

Author keywords

Defect; Electrochemical noise (EN); Electron work function (EWF); Pitting; Self assembled monolayers (SAMs)

Indexed keywords

CHLORINE; CORROSION PROTECTION; CYCLIC VOLTAMMETRY; ELECTROCHEMISTRY; ELECTRODES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NITRIC ACID; PITTING; POLARIZATION; SELF ASSEMBLY; SURFACE TREATMENT;

ELECTRON WORK FUNCTION (EWF);

COPPER;

EID: 0042694784     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00573-7     Document Type: Article

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