Local Electrical Thickness-mapping of Thin Oxides with Conducting Atomic Force Microscopy

Conference Proceedings from the International Symposium for Testing and Failure Analysis

Volumn , Issue , 2000, Pages 511-519

  Olbrich, Alexander ^a   Ebersberger, Bernd ^a   Bolt, Christian ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; CURRENT VOLTAGE CHARACTERISTICS; CURVE FITTING; DEFECTS; ELECTRIC POTENTIAL; ELECTRIC VARIABLES MEASUREMENT; FAILURE ANALYSIS; LEAKAGE CURRENTS; QUANTUM THEORY; SPECTROSCOPIC ANALYSIS; THICKNESS MEASUREMENT;

ELECTRICAL THICKNESS MAPPING; THIN OXIDES;

DIELECTRIC FILMS;

EID: 1542330705     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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