Free volume variations during exposure and PEB of DUV positive resists: effect on dissolution properties

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 100-109

  Pain, Laurent ^a   Le Cornec, Charles ^a   Rosilio, Charles ^a   Paniez, Patrick J ^a  

^a ORANGE LABS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ANALYSIS; COATINGS; DISSOLUTION; ULTRAVIOLET RADIATION;

CHEMICALLY AMPLIFIED POSITIVE RESIST; DEEP-ULTRAVIOLET RESISTS; POST-EXPOSURE BAKE;

PHOTORESISTS;

EID: 0029765946     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.241878     Document Type: Conference Paper

References (9)