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Volumn 150, Issue 8, 2003, Pages

The deposition characteristics of accelerated nonformaldehyde electroless copper plating

Author keywords

[No Author keywords available]

Indexed keywords

CATALYST ACTIVITY; COMPOSITION; DEPOSITION; ELECTROPLATING; OXIDATION; PHOSPHORUS COMPOUNDS; RATE CONSTANTS; SCANNING ELECTRON MICROSCOPY; SODIUM COMPOUNDS; SOLUTIONS; STRUCTURE (COMPOSITION); SULFUR COMPOUNDS;

EID: 0042208252     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1591760     Document Type: Article
Times cited : (53)

References (16)
  • 14
    • 0042493843 scopus 로고    scopus 로고
    • JCPDS-International Center for Diffraction Data, Swarthmore, PA
    • JCPDS-International Center for Diffraction Data, Swarthmore, PA (1997).
    • (1997)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.