Topographical and surface chemical characterization of nanosecond pulsed-laser micromachining of titanium at 532-nm wavelength

Applied Physics A: Materials Science and Processing

Volumn 77, Issue 3-4, 2003, Pages 491-498

  Reimers, H ^a   Gold, J ^a   Kasemo, B ^a   Chakarov, D ^a  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ELECTROLYTIC POLISHING; HEAT AFFECTED ZONE; IMAGE ANALYSIS; INTERFEROMETRY; MELTING; MICROMACHINING; NANOTECHNOLOGY; OPTICAL MICROSCOPY; PULSED LASER APPLICATIONS; SURFACE TOPOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY;

FOCAL SPOT SIZE; MELT EJECTION; NANOSECOND PULSED LASER MICROMACHINING; SURFACE CHEMICAL CHARACTERIZATION;

TITANIUM;

EID: 0042159839     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-002-1477-6     Document Type: Article

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