Diluted low dielectric constant materials as bottom antireflective coating layers for both KrF and ArF lithography processes

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 3885-3889

  Chen, Hsuen Li ^a   Chao, Wen Chi ^a   Ko, Fu Hsiang ^a   Chu, Tien Chi ^b   Cheng, Hsu Chun ^a  

^a NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

ArF lithography; Bottom antireflective coatings; Diluted; KrF lithography; Low dielectric constant materials

Indexed keywords

ANTIREFLECTION COATINGS; AROMATIC HYDROCARBONS; GAS LASERS; INTERFACES (MATERIALS); PERMITTIVITY;

BOTTOM ANTIREFLECTIVE COATINGS (BARC);

PHOTOLITHOGRAPHY;

EID: 0041862477     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.3885     Document Type: Conference Paper

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