Low dielectric constant polymer materials as bottom antireflective coating layers for both KrF and ArF lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4046-4050

  Chen, Hsuen Li ^a,b   Cheng, Hsu Chun ^a   Ko, Fu Hsiang ^a   Chu, Tien Chi ^a   Huang, Tiao Yuan ^a  

^a NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

ArF lithography; Bottom antireflective coatings; KrF lithography; Low dielectric constant materials; SiLK

Indexed keywords

ANTIREFLECTION COATINGS; ETCHING; FLUORINE COMPOUNDS; INTERFACES (MATERIALS); LIGHT REFLECTION; MASKS; PERMITTIVITY; POLYMERS; SUBSTRATES; THERMODYNAMIC STABILITY;

METAL INTERCONNECTS;

PHOTOLITHOGRAPHY;

EID: 0036614577     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4046     Document Type: Article

References (13)