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Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 1187-1190

Deposition of amorphous carbon using a shunting arc discharge

(6) Yukimura, Ken a Kumagai, Motoya a Kumagai, Masao b Saito, Hidenori c Kohata, Mamoru d Takaki, Koichi e

a DOSHISHA UNIVERSITY (Japan)

b KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY (Japan)

c Kanagawa High Technology Foundation (Japan)

d Toshiba Tungaloy (Japan)

e IWATE UNIVERSITY (Japan)

Author keywords

Amorphous carbon film; Arc discharge; Deposition; Diamond like carbon; Plasma based ion implantation; Preferred orientation

Indexed keywords

AMORPHOUS MATERIALS; GLOW DISCHARGES; RAMAN SCATTERING; SUBSTRATES;

SHUNTING ARCS;

DIAMOND LIKE CARBON FILMS;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0041826921 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(03)00368-2 Document Type: Article

Times cited : (17)

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