Generation of triggerless silicon shunting plasma and ion extraction

Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 388-391

  Yukimura, Ken ^a   Tani, Yuji ^a  

^a DOSHISHA UNIVERSITY   (Japan)

Author keywords

Electrical characteristics; Pulsed silicon; Shunting plasma

Indexed keywords

CARBON; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; EMISSION SPECTROSCOPY; NIOBIUM; PLASMA SHEATHS; SILICON; SURFACE DISCHARGES;

ION EXTRACTION; SHUNTING PLASMA;

PLASMA APPLICATIONS;

HARDNESS; ION IMPLANTATION; PLASMA TREATMENT; WEAR RESISTANCE;

EID: 0035387385     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01278-6     Document Type: Article

References (3)

1. Carbon shunting arc and its induced plasma