SCOPUS 정보 검색 플랫폼

Journal of Applied Physics

Volumn 88, Issue 1, 2000, Pages 537-543

Modeling of the formation of cationic silicon clusters in a remote Ar/H2/SiH4 plasma

(4) Leroux, A a Kessels, W M M a Schram, D C a Van De Sanden, M C M a

a EINDHOVEN UNIVERSITY OF TECHNOLOGY (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041687527 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.373692 Document Type: Article

Times cited : (3)

References (38)

1
- 0003922542
- Marcel Dekker, New York
- W. Luft and Y. S. Tsuo, Hydrogenated Amorpheous Silicon Alloy Deposition Processes (Marcel Dekker, New York, 1993).
- (1993) Hydrogenated Amorpheous Silicon Alloy Deposition Processes
- Luft, W.¹ Tsuo, Y.S.²

2
- 0000622101
- W. M. M. Kessels, M. C. M. van de Sanden, and D. C. Schram, Appl. Phys. Lett. 72, 2397 (1998).
- (1998) Appl. Phys. Lett. , vol.72 , pp. 2397
- Kessels, W.M.M.¹ Van De Sanden, M.C.M.² Schram, D.C.³

3
- 0001187722
- W. M. M. Kessels, C. M. Leewis, A. Leroux, M. C. M. van de Sanden, and D. C. Schram, J. Vac. Sci. Technol. A 17, 1531 (1999).
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 1531
- Kessels, W.M.M.¹ Leewis, C.M.² Leroux, A.³ Van De Sanden, M.C.M.⁴ Schram, D.C.⁵

4
- 0042079775
- W. M. M. Kessels, C. M. Leewis, M. C. M. van de Sanden, and D. C. Schram, J. Appl. Phys. 86, 7 (1999).
- (1999) J. Appl. Phys. , vol.86 , pp. 7
- Kessels, W.M.M.¹ Leewis, C.M.² Van De Sanden, M.C.M.³ Schram, D.C.⁴

5
- 0042079773
- A. A. Howling, J. L. Dorier, and Ch. Hollenstein, Appl. Phys. Lett. 62, 12 (1993).
- (1993) Appl. Phys. Lett. , vol.62 , pp. 12
- Howling, A.A.¹ Dorier, J.L.² Hollenstein, Ch.³

6
- 36149033835
- J. Perrin, C. Bohm, R. Etemadi, and A. Lloret, Plasma Sources Sci. Technol. 3, 252 (1994).
- (1994) Plasma Sources Sci. Technol. , vol.3 , pp. 252
- Perrin, J.¹ Bohm, C.² Etemadi, R.³ Lloret, A.⁴

7
- 84967508860
- A. A. Howling, C. Courteille, J. L. Dorier, L. Sansonnens, and Ch. Hollenstein, Pure Appl. Chem. 68, 1017 (1996).
- (1996) Pure Appl. Chem. , vol.68 , pp. 1017
- Howling, A.A.¹ Courteille, C.² Dorier, J.L.³ Sansonnens, L.⁴ Hollenstein, Ch.⁵

8
- 0043081586
- H. M. Anderson, R. Jairath, and J. L. Mock, J. Appl. Phys. 67, 9 (1990).
- (1990) J. Appl. Phys. , vol.67 , pp. 9
- Anderson, H.M.¹ Jairath, R.² Mock, J.L.³

9
- 0038090633
- W. W. Stoffels, E. Stoffels, G. M. W. Kroesen, M. Haverlag, J. H. W. G. den Boer, and F. J. de Hoog, Plasma Sources Sci. Technol. 3, 320 (1994).
- (1994) Plasma Sources Sci. Technol. , vol.3 , pp. 320
- Stoffels, W.W.¹ Stoffels, E.² Kroesen, G.M.W.³ Haverlag, M.⁴ Den Boer, J.H.W.G.⁵ De Hoog, F.J.⁶

10
- 0042580785
- M. Shiratani, T. Fukuzawa, and Y. Watanabe, IEEE Trans. Plasma Sci. 22, 2 (1994).
- (1994) IEEE Trans. Plasma Sci. , vol.22 , pp. 2
- Shiratani, M.¹ Fukuzawa, T.² Watanabe, Y.³

11
- 0042079772
- L. Boufendi, J. Hermann, A. Bouchoule, B. Dubreuil, E. Stoffels, W. W. Stoffels, and M. L. de Giorgi, J. Appl. Phys. 76, 1 (1994).
- (1994) J. Appl. Phys. , vol.76 , pp. 1
- Boufendi, L.¹ Hermann, J.² Bouchoule, A.³ Dubreuil, B.⁴ Stoffels, E.⁵ Stoffels, W.W.⁶ De Giorgi, M.L.⁷

12
- 4243314800
- Y. Watanabe, Plasma Phys. Controlled Fusion 39, A5g (1997).
- (1997) Plasma Phys. Controlled Fusion , vol.39
- Watanabe, Y.¹

13
- 0043081585
- E. Stoffels, W. W. Stoffels, G. M. Kroesen, and F. J. De Hoog, Electron Technol. 31, 2 (1998).
- (1998) Electron Technol. , vol.31 , pp. 2
- Stoffels, E.¹ Stoffels, W.W.² Kroesen, G.M.³ De Hoog, F.J.⁴

14
- 0041578722
- P. Haaland, A. Garscadden, and B. Ganguly, Appl. Phys. Lett. 69, 7 (1996).
- (1996) Appl. Phys. Lett. , vol.69 , pp. 7
- Haaland, P.¹ Garscadden, A.² Ganguly, B.³

15
- 0001635463
- I. Haller, Appl. Phys. Lett. 37, 282 (1980).
- (1980) Appl. Phys. Lett. , vol.37 , pp. 282
- Haller, I.¹

16
- 0043081582
- I. Haller, J. Vac. Sci. Technol. A 1, 3 (1983).
- (1983) J. Vac. Sci. Technol. A , vol.1 , pp. 3
- Haller, I.¹

17
- 84910971886
- H. A. Weakliem, R. D. Estes, and P. A. Longeway, J. Vac. Sci. Technol. A 5, 29 (1987).
- (1987) J. Vac. Sci. Technol. A , vol.5 , pp. 29
- Weakliem, H.A.¹ Estes, R.D.² Longeway, P.A.³

18
- 4043105192
- M. J. Kushner, J. Appl. Phys. 63, 2532 (1988).
- (1988) J. Appl. Phys. , vol.63 , pp. 2532
- Kushner, M.J.¹

19
- 0042580784
- J. M. Jasinski, J. Vac. Sci. Technol. A 13, 4 (1995).
- (1995) J. Vac. Sci. Technol. A , vol.13 , pp. 4
- Jasinski, J.M.¹

20
- 0001019934
- M. C. M. van de Sanden, R. J. Severens, W. M. M. Kessels, R. F. G. Meulenbroeks, and D. C. Schram, J. Appl. Phys. 84, 2426 (1998).
- (1998) J. Appl. Phys. , vol.84 , pp. 2426
- Van De Sanden, M.C.M.¹ Severens, R.J.² Kessels, W.M.M.³ Meulenbroeks, R.F.G.⁴ Schram, D.C.⁵

21
- 84984329718
- G. M. W. Kroesen, D. C. Schram, A. T. M. Wilbers, and G. J. Meeusen, Contrib. Plasma Phys. 31, 27 (1991).
- (1991) Contrib. Plasma Phys. , vol.31 , pp. 27
- Kroesen, G.M.W.¹ Schram, D.C.² Wilbers, A.T.M.³ Meeusen, G.J.⁴

22
- 0041578716
- Aero Propulsion Laboratory, U.S. Air Force Wright Aeronautical Laboratory, Wright Patterson Air Force Base, OH
- P. Haaland, Technical Report No. AFWAL-TR88-2043, Aero Propulsion Laboratory, U.S. Air Force Wright Aeronautical Laboratory, Wright Patterson Air Force Base, OH, 1988.
- (1988) Technical Report No. AFWAL-TR88-2043
- Haaland, P.¹

23
- 36449004638
- G. J. Meeusen, E. A. Ershov-Pavlov, R. F. G. Meulenbroeks, M. C. M. van de Sanden, and D. C. Schram, J. Appl. Phys. 51, 4156 (1992).
- (1992) J. Appl. Phys. , vol.51 , pp. 4156
- Meeusen, G.J.¹ Ershov-Pavlov, E.A.² Meulenbroeks, R.F.G.³ Van De Sanden, M.C.M.⁴ Schram, D.C.⁵

24
- 0004763344
- M. J. de Graaf, R. P. Dahiya, J. L. Jasuberteau, F. J. de Hoog, M. J. F. van de Sande, and D. C. Schram, J. Phys. (Paris), Colloq. 51, 387 (1990).
- (1990) J. Phys. (Paris), Colloq. , vol.51 , pp. 387
- De Graaf, M.J.¹ Dahiya, R.P.² Jasuberteau, J.L.³ De Hoog, F.J.⁴ Van De Sande, M.J.F.⁵ Schram, D.C.⁶

25
- 0001648535
- M. J. de Graaf, R. Severens, R. P. Dahiya, M. C. M. van de Sanden, and D. C. Schram, Phys. Rev. E 48, 2098 (1993).
- (1993) Phys. Rev. E , vol.48 , pp. 2098
- De Graaf, M.J.¹ Severens, R.² Dahiya, R.P.³ Van De Sanden, M.C.M.⁴ Schram, D.C.⁵

26
- 35949008124
- R. F. G. Meulenbroeks, A. J. van Beek, A. J. G. van Helvoort, M. C. M. van de Sanden, and D. C. Schram, Phys. Rev. E 49, 4397 (1994).
- (1994) Phys. Rev. E , vol.49 , pp. 4397
- Meulenbroeks, R.F.G.¹ Van Beek, A.J.² Van Helvoort, A.J.G.³ Van De Sanden, M.C.M.⁴ Schram, D.C.⁵

27
- 0029252871
- R. F. G. Meulenbroeks, R. A. H. Engeln, M. N. A. Beurskens, R. M. J. Paffen, M. C. M. van de Sanden, J. A. M. van der Mullen, and D. C. Schram, Plasma Sources Sci. Technol. 4, 74 (1995).
- (1995) Plasma Sources Sci. Technol. , vol.4 , pp. 74
- Meulenbroeks, R.F.G.¹ Engeln, R.A.H.² Beurskens, M.N.A.³ Paffen, R.M.J.⁴ Van De Sanden, M.C.M.⁵ Van Der Mullen, J.A.M.⁶ Schram, D.C.⁷

28
- 0006754224
- R. F. G. Meulenbroeks, R. A. H. Engeln, C. Box, I. De Bari, M. C. M. van de Sanden, J. A. M. van der Mullen, and D. C. Schram, Phys. Plasmas 2, 1002 (1995).
- (1995) Phys. Plasmas , vol.2 , pp. 1002
- Meulenbroeks, R.F.G.¹ Engeln, R.A.H.² Box, C.³ De Bari, I.⁴ Van De Sanden, M.C.M.⁵ Van Der Mullen, J.A.M.⁶ Schram, D.C.⁷

29
- 0002757504
- J. Perrin, O. Leroy, and M. C. Bordage, Contrib. Plasma Phys. 36, 1 (1996).
- (1996) Contrib. Plasma Phys. , vol.36 , pp. 1
- Perrin, J.¹ Leroy, O.² Bordage, M.C.³

30
- 0042079771
- T. M. H. Cheng and F. W. Lampe, Chem. Phys. Lett. 19, 532 (1973).
- (1973) Chem. Phys. Lett. , vol.19 , pp. 532
- Cheng, T.M.H.¹ Lampe, F.W.²

31
- 0010865822
- M. L. Mandich and W. D. Reents, J. Chem. Phys. 90, 3121 (1989).
- (1989) J. Chem. Phys. , vol.90 , pp. 3121
- Mandich, M.L.¹ Reents, W.D.²

32
- 0012005379
- L. E. Kline, IEEE Trans. Plasma Sci. PS-10, 24 (1982).
- (1982) IEEE Trans. Plasma Sci. , vol.PS-10 , pp. 24
- Kline, L.E.¹

33
- 0001648535
- M. J. de Graaf, R. J. Severens, R. P. Dahiya, M. C. M. van de Sanden, and D. C. Schram, Phys. Rev. E 48, 2098 (1993).
- (1993) Phys. Rev. E , vol.48 , pp. 2098
- De Graaf, M.J.¹ Severens, R.J.² Dahiya, R.P.³ Van De Sanden, M.C.M.⁴ Schram, D.C.⁵

34
- 0043081584
- R. F. G. Meulenbroeks, M. F. M. Steenbakkers, Z. Qing, M. C. M. van de Sanden, and D. C. Schram, Phys. Rev. E 49, 2272 (1994).
- (1994) Phys. Rev. E , vol.49 , pp. 2272
- Meulenbroeks, R.F.G.¹ Steenbakkers, M.F.M.² Qing, Z.³ Van De Sanden, M.C.M.⁴ Schram, D.C.⁵

35
- 0000210872
- R. F. G. Meulenbroeks, D. C. Schram, M. C. M. van de Sanden, and J. A. M. van der Mullen, Phys. Rev. Lett. 76, 1840 (1996).
- (1996) Phys. Rev. Lett. , vol.76 , pp. 1840
- Meulenbroeks, R.F.G.¹ Schram, D.C.² Van De Sanden, M.C.M.³ Van Der Mullen, J.A.M.⁴

36
- 0000569936
- M. C. M. van de Sanden, J. M. de Regt, and D. C. Schram, Plasma Sources Sci. Technol. 3, 501 (1994).
- (1994) Plasma Sources Sci. Technol. , vol.3 , pp. 501
- Van De Sanden, M.C.M.¹ De Regt, J.M.² Schram, D.C.³

37
- 0041578721
- Doorwerth, The Netherlands
- M. G. H. Boogaarts, G. J. Brinkman, H. W. P. van de Heijden, P. Vankan, S. Mazzouffre, J. A. M. van der Mullen, D. C Schram, and H. F. Döbele, Proceedings of the Eighth International Symposium, Laser-Aided Plasma Diagnostics (Doorwerth, The Netherlands, 1997).
- (1997) Proceedings of the Eighth International Symposium, Laser-aided Plasma Diagnostics
- Boogaarts, M.G.H.¹ Brinkman, G.J.² Van De Heijden, H.W.P.³ Vankan, P.⁴ Mazzouffre, S.⁵ Van Der Mullen, J.A.M.⁶ Schram, D.C.⁷ Döbele, H.F.⁸

38
- 0000393179
- S. K. Loh and J. M. Jasinski, J. Chem. Phys. 95, 4914 (1991).
- (1991) J. Chem. Phys. , vol.95 , pp. 4914
- Loh, S.K.¹ Jasinski, J.M.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.