Surface modification on low dielectric constant material - Methylsilsesquioxane

Thin Solid Films

Volumn 441, Issue 1-2, 2003, Pages 248-254

  Chen, Chung Hsien ^a   Huang, Fon Shan ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Oxygen thermal treatment; Poole Frenkel mechanism; Space charge limited current; Thermal stability

Indexed keywords

CAPACITANCE; COMPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; METALLIZING; OXYGEN; PERMITTIVITY; PLASMAS; SURFACE TREATMENT; THERMODYNAMIC STABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

THERMAL OXYGEN;

DIELECTRIC MATERIALS;

EID: 0041507112     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00951-9     Document Type: Article

References (14)

1. Havemann R.H., Hutchby J.A. Proc. IEEE. 89:2001;586.
2. Davis J.A., Venkatesan R., Kaloyeros A., Beylansky M., Souri S.J., Banerjee K., Saraswat K.C., Rahman A., Reif R., Meindl J.D. Proc. IEEE. 89:2001;305.
3. Allied Signal Advanced Materials, Accuspin 418 Flowable Spin-on Polymer, Product Bulletin, Sunnyvale, CA, 1996.
4. Chua C.T., Sarkar G., Chooi S.Y.M., Chan L. J. Mater. Sci. Lett. 18:1999;33.
5. H.D. Jeong, H.S. Park, H.J. Shin, B.J. Kim, H.K. Kang, M.Y. Lee, Proceeding of the IEEE 1999 International Interconnect Technology Conference, San Francisco, CA, May 24-26, 1999, IEEE, 1999, p. 190.
6. Chang T.C., Mei Y.J., Mor Y.S., Perng T.H., Yang Y.L., Sze S.M. J. Vac. Sci. Technol. B. 17:1999;2325.
7. Lin C.F., Tung I.C., Feng M.S. Jpn. J. Appl. Phys. 38:1999;6253.
8. J.C.M. Hui, Y. Xu, C.Y. Foong, L. Marvin, L. Charles, L.Y. Shung, A. Inamdar, J. Yang, J. Kennedy, M. Ross, S.Q. Wang, Proceeding of the IEEE 1998 International Interconnect Technology Conference, San Francisco, CA, June 1-3, 1998, IEEE, 1998, p. 217.
9. Shacham-Diamand Y., Dubin V., Angyal M. Thin Solid Films. 262:1995;93.
10. Colthup N.B., Daly L.H., Wiberley S.E. Introduction to Infrared and Raman Spectroscopy. 1990;Academic Press. Chap. 12.
11. Sze S.M. Physics of Semiconductor Devices. 1981;395 John Wiley and Sons, New York.
12. S.U. Kim. T. Cho, P.S. Ho, 1999 IEEE International Reliability Physics Symposium Proceedings 37th Annual, San Diego, CA, March 23-25, 1999, IEEE, 1999, p. 277.
13. Rose A. Phys. Rev. 97:1955;1538.
14. Sze S.M. Physics of Semiconductor Devices. 1981;403 John Wiley and Sons, New York.