Property of single-crystalline Si TFTs fabricated with μ-Czochralski (grain filter) process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5004, Issue , 2003, Pages 10-19

  Ishihara, Ryoichi ^a   Van der Wilt, Paul Ch ^a   Van Dijk, Barry D ^a   Metselaar, J W ^a   Beenakker, C I M ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Excimer laser; Location control; Poly Si; Single crystalline Si; Thin film transistor

Indexed keywords

CRYSTAL GROWTH FROM MELT; CRYSTALLIZATION; EXCIMER LASERS; PHOTOLITHOGRAPHY; SINGLE CRYSTALS;

SYSTEM-CIRCUIT INTEGRATION;

THIN FILM TRANSISTORS;

EID: 0041358890     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482582     Document Type: Conference Paper

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