Single-crystal Si films via a low-substrate-temperature excimer-laser crystallization method

Materials Research Society Symposium - Proceedings

Volumn 452, Issue , 1997, Pages 953-958

  Sposili, Robert S ^a   Crowder, M A ^a   Im, James S ^a  

^a Och Spine at New York Presbyterian Hospitals   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CRYSTAL DEFECTS; CRYSTAL MICROSTRUCTURE; CRYSTALLIZATION; EXCIMER LASERS; GRAIN BOUNDARIES; OPTICAL MICROSCOPY; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SILICA; SINGLE CRYSTALS; THIN FILM TRANSISTORS;

EXCIMER LASER CRYSTALLIZATION; SEQUENTIAL LATERAL SOLIDIFICATION;

THIN FILMS;

EID: 0030654068     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)