메뉴 건너뛰기




Volumn 5148, Issue , 2003, Pages 225-234

Simulation study of pattern printability for reflective mask in EUV lithography

Author keywords

Alternating phase shift mask; Attenuated phase shift mask; Optical proximity correction

Indexed keywords

COMPUTER SIMULATION; LITHOGRAPHY; LSI CIRCUITS; PHASE SHIFT; ULTRAVIOLET DEVICES;

EID: 0041326436     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.515147     Document Type: Conference Paper
Times cited : (2)

References (19)
  • 1
    • 0036380155 scopus 로고    scopus 로고
    • Pattern printability for off-axis incident light in EUV lithography
    • M. Sugawara, M. Ito, T. Ogawa, E. Hoshino, A, Chiba, S. Okazaki, "Pattern printability for off-axis incident light in EUV lithography", Proc. of SPIE, vol. 4688, pp. 277-188, 2002.
    • (2002) Proc. of SPIE , vol.4688 , pp. 277-188
    • Sugawara, M.1    Ito, M.2    Ogawa, T.3    Hoshino, E.4    Chiba, A.5    Okazaki, S.6
  • 4
    • 0037627551 scopus 로고    scopus 로고
    • EUVL alternating phase shift mask imaging evaluation
    • to be published
    • Pei-Yang Yan, "EUVL alternating phase shift mask imaging evaluation", Proc. of SPIE vol. 4889 to be published.
    • Proc. of SPIE , vol.4889
    • Yan, P.-Y.1
  • 5
    • 0032677812 scopus 로고    scopus 로고
    • Simulation on a new reflection type attenuated phase shifting mask for extreme ultraviolet lithography
    • H. L. Chen and L. A. Wang, "Simulation on a new reflection type attenuated phase shifting mask for extreme ultraviolet lithography", Proc. of SPIE, vol. 3676, pp. 578-586, 1999
    • (1999) Proc. of SPIE , vol.3676 , pp. 578-586
    • Chen, H.L.1    Wang, L.A.2
  • 6
    • 0036379010 scopus 로고    scopus 로고
    • Novel design of att-PSM structure for extreme ultra violet lithography and enhancement of image contrast during inspection
    • Sang-In Han, J. R. Easson, P. J. Mangat, J. L. Cobb, K. Lucas and S. D. Hector, "Novel design of att-PSM structure for extreme ultra violet lithography and enhancement of image contrast during inspection" Proc. of SPIE, vol. 4688, pp. 481-494, 2002.
    • (2002) Proc. of SPIE , vol.4688 , pp. 481-494
    • Han, S.-I.1    Easson, J.R.2    Mangat, P.J.3    Cobb, J.L.4    Lucas, K.5    Hector, S.D.6
  • 8
    • 0027814427 scopus 로고
    • Hole pattern fabrication using halftone phase-shifting masks in KrF lithography
    • A. Otaka, Y. Kawai and T. Matsuda, "Hole pattern fabrication using halftone phase-shifting masks in KrF lithography", Jpn. J. Appl. Phys., vol. 32, pp. 5880-5886, 1993.
    • (1993) Jpn. J. Appl. Phys. , vol.32 , pp. 5880-5886
    • Otaka, A.1    Kawai, Y.2    Matsuda, T.3
  • 9
    • 0027889038 scopus 로고
    • Monolayer halftone phase-shifting mask for KrF excimer laser lithography
    • Y. Iwabuchi, J. Ushioda, H. Tanabe, Y. Ogura and S. Kishida, "Monolayer halftone phase-shifting mask for KrF excimer laser lithography", Jpn. J. Appl. Phys., vol. 32, pp. 5900-6784, 1993.
    • (1993) Jpn. J. Appl. Phys. , vol.32 , pp. 5900-6784
    • Iwabuchi, Y.1    Ushioda, J.2    Tanabe, H.3    Ogura, Y.4    Kishida, S.5
  • 11
    • 84957337636 scopus 로고
    • Evaluation of phase-shifting masks for dense contact holes using the exposure-defocus and mask fabrication latitude methodology
    • M. Sugawara, H. Kawahira, K. Tsudaka, A. Ogura and S. Nozawa, "Evaluation of phase-shifting masks for dense contact holes using the exposure-defocus and mask fabrication latitude methodology", Jpn. J. Appl. Phys., vol. 33, pp. 6801-6808, 1994.
    • (1994) Jpn. J. Appl. Phys. , vol.33 , pp. 6801-6808
    • Sugawara, M.1    Kawahira, H.2    Tsudaka, K.3    Ogura, A.4    Nozawa, S.5
  • 13
    • 0032624670 scopus 로고    scopus 로고
    • Calculating aerial images from EUV masks
    • T. Pistor, and A. R. Neureuther, "Calculating aerial images from EUV masks", Proc. of SPIE, vol. 3676 pp. 679-696, 1999
    • (1999) Proc. of SPIE , vol.3676 , pp. 679-696
    • Pistor, T.1    Neureuther, A.R.2
  • 14
    • 0003705852 scopus 로고    scopus 로고
    • Electromagnetic simulation and modeling with applications in lithography
    • Thesis
    • T. Pistor, "Electromagnetic Simulation and Modeling with Applications in lithography", Thesis, 2001.
    • (2001)
    • Pistor, T.1
  • 16
    • 84975672166 scopus 로고
    • Layer-by-layer design method for soft-x-ray multilayers
    • M. Yamamoto and T. Namioka "Layer-by-layer design method for soft-x-ray multilayers", Applied Optics, vol. 31, pp. 1622-1630, (1992).
    • (1992) Applied Optics , vol.31 , pp. 1622-1630
    • Yamamoto, M.1    Namioka, T.2
  • 18
    • 0038186036 scopus 로고    scopus 로고
    • Optical engineering
    • C. A. Mack, Optical Engineering, Proc. of SPIE, vol. 1674, p. 272, 1999.
    • (1999) Proc. of SPIE , vol.1674 , pp. 272
    • Mack, C.A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.