High aperture diffractive x-ray and extreme ultraviolet optical elements for microscopy and lithography applications

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3212-3215

  Hambach, D ^a   Schneider, G ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040708574     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590982     Document Type: Article

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